Tungsten-doped zinc oxide（ZnO：W） films with low resistivity and high transmittance were successfully deposited on glass substrates by direct current magnetron sputtering at low temperature.The deposition pressure is varied from 12 to 21 Pa.The X-ray diffraction results show that all of the deposited films are polycrystalline and have a hexagonal structure with a preferred c-axis orientation.The crystallinity,morphologies and resistivity of ZnO：W films greatly depend on deposition pressure while the optical properties including optical transmittance, optical band gap as well as refractive index are not sensitive to deposition pressure.The deposited films with an electrical resistivity as low as 1.5×10^（-4）Ω·cm,sheet resistance of 6.8Ω/□and an average transmittance of 91.3% in the visible range were obtained at a deposition pressure of 21 Pa and sputtering power of 130 W.
Mn-W co-doped ZnO（ZMWO） thin films with low resistivity and high transparency were successfully prepared on glass substrate by direct current（DC） magnetron sputtering at low temperature.The sputtering power was varied from 65 to 150 W.The crystallinity and resistivity of ZMWO films greatly depend on sputtering power while the optical transmittance and optical band gap are not sensitive to sputtering power.All the deposited films are polycrystalline with a hexagonal structure and have a preferred orientation along the c-axis perpendicular to the substrate.Considering the crystallinity and the electrical and optical properties,we suggest that the optimal sputtering power in this experiment is 90 W and,at this power,the ZMWO film has the lowest resistivity of 9.8×10^（-4）Ω.cm with a high transmittance of approximately 89%in the visible range.
