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国家自然科学基金(51005154)

作品数:7 被引量:24H指数:3
相关作者:孙方宏沈彬王新昶张建国陈苏琳更多>>
相关机构:上海交通大学济南大学上海交友钻石涂层有限公司更多>>
发文基金:国家自然科学基金中国博士后科学基金更多>>
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CVD掺硅金刚石残余应力的X射线衍射和拉曼光谱分析(英文)被引量:9
2012年
采用X射线衍射(XRD)和拉曼光谱2种方法测量了不同硅碳比的CVD掺硅金刚石薄膜的残余应力。采用偏压增强热丝化学气相沉积装置在硬质合金基底上制备了掺硅金刚石薄膜,将正硅酸乙酯以不同的体积比溶解在丙酮中以使得反应气体中的硅碳比从0.1%变化到1.4%,从而控制掺硅金刚石薄膜的掺杂浓度。SEM和XRD的表征结果显示,随着硅掺杂浓度的增加,金刚石薄膜的晶粒尺寸减小,而金刚石(110)的晶面则逐渐占优。XRD法是测量入射角从0°到45°变化时对应的金刚石(220)面XRD衍射峰,并采用sin2ψ方法计算掺硅金刚石薄膜的残余应力。拉曼谱法则是通过检测金刚石特征峰偏移1332cm1位置的偏移量来测量残余应力。2种方法测得的残余应力随着硅掺杂含量的升高显示出良好的一致性,所有的硅掺杂金刚石的残余应力均为压应力,Si/C摩尔比为0.1%的薄膜具有最高的残余应力,为~1.75GPa(拉曼谱法)或~2.3GPa(XRD法)。随着硅掺杂浓度的进一步升高,薄膜的残余应力则稳定在~1.3GPa左右。
陈苏琳沈彬张建国王亮孙方宏
关键词:残余应力X射线衍射拉曼光谱
Fabrication and Drilling Tests of Chemical Vapor Deposition Diamond Coated Drills in Machining Carbon Fiber Reinforced Plastics
2013年
Chemical vapor deposition (CVD) diamond coated drills are fabricated by depositing diamond films on Co-cemented tungsten carbide (WC-Co) drills. The characteristics of as-deposited diamond coatings are investigated by scanning electron microscope (SEM) and Raman spectra. To evaluate the cutting performance of diamond coated drills, comparative drilling tests are conducted using diamond coated and uncoated WC-Co drills, with carbon fiber reinforced plastics (CFRPs) as the workpiece on a high-speed computer numerical control (CNC) machine. Thrust force and tool wear are measured during the drilling process. The results show that diamond coated drill exhibits better cutting performance, compared with the uncoated drill. The value of flank wear is about 70 μm after machining 90 holes, about a half of that of the WC-Co drill with 145 μm after drilling only 30 holes. The wear rate of WC-Co drill is higher than that of diamond coated drill before diamond films peeling off. The diamond coated drill achieves more predictable hole quality. The improved cutting performance of the diamond coated drill is due to the high hardness, wear resistance and low coefficient of friction.
张建国沈彬孙方宏
关键词:CVDCNC
Wear Behavior of Diamond-Coated Drawing Dies被引量:1
2011年
The failure behavior of diamond-coated die was investigated experimentally and analytically through finite element method (FEM) simulation in the present work. Diamond coatings were fabricated by straight hot filament chemical vapor deposition (CVD) passing through the interior hole of the drawing die using a mixture of hydrogen and acetone as source gases. The performance tests were made under real drawing condition. Scanning electron microscopy (SEM) was used for the study of coating wear after die service. The coating wear appears on two regions of the reduction zone: one is near the entrance where the contact begins, and the other is at the end of the reduction zone. FEM simulation was made for calculating the von Mises stresses distribution on the coating and substrate during the drawing process. The present work was of great practical significance for the improvement of drawing performance of diamond-coated drawing dies.
林子超孙方宏沈彬
关键词:金刚石涂层磨损行为化学气相沉积法
金刚石形核及薄膜生长过程中不同钴含量WC-Co基体中的钴演变(英文)被引量:4
2018年
在具有不同钴含量(6%,10%和12%,质量分数)的硬质合金样品上进行系统试验。基于XPS和EDX检测方法,采用正交试验方法证明了酸浓度、酸处理时间和原始钴含量对去钴深度有显著影响。在此基础上,研究形核、纯氢气氛围加热及生长试验条件下基体温度、原始钴含量及去钴深度对钴演变的影响规律。得到金刚石薄膜涂层器件制备全过程中钴元素的演变机理,为WC-Co基体表面、尤其是高钴含量WC-Co基体表面高质量金刚石薄膜的沉积提供理论依据。结果表明:高钴基体通常表现出较快的钴扩散速度;较高的基体温度会促进预处理基体中的钴扩散,但是在未处理基体中却表现出钴刻蚀作用;对于WC-12%Co基体,较为合适的预处理深度为8-9μm。
王新昶王成川何为凯孙方宏
关键词:WC-CO
Friction and Wear Performance of Boron Doped, Undoped Microcrystalline and Fine Grained Composite Diamond Films被引量:5
2015年
Chemical vapor deposition(CVD) diamond films have attracted more attentions due to their excellent mechanical properties. Whereas as-fabricated traditional diamond films in the previous studies don't have enough adhesion or surface smoothness, which seriously impact their friction and wear performance, and thus limit their applications under extremely harsh conditions. A boron doped, undoped microcrystalline and fine grained composite diamond(BD-UM-FGCD) film is fabricated by a three-step method adopting hot filament CVD(HFCVD) method in the present study, presenting outstanding comprehensive performance, including the good adhesion between the substrate and the underlying boron doped diamond(BDD) layer, the extremely high hardness of the middle undoped microcrystalline diamond(UMCD) layer, as well as the low surface roughness and favorable polished convenience of the surface fine grained diamond(FGD) layer. The friction and wear behavior of this composite film sliding against low-carbon steel and silicon nitride balls are studied on a ball-on-plate rotational friction tester. Besides, its wear rate is further evaluated under a severer condition using an inner-hole polishing apparatus, with low-carbon steel wire as the counterpart. The test results show that the BD-UM-FGCD film performs very small friction coefficient and great friction behavior owing to its high surface smoothness, and meanwhile it also has excellent wear resistance because of the relatively high hardness of the surface FGD film and the extremely high hardness of the middle UMCD film. Moreover, under the industrial conditions for producing low-carbon steel wires, this composite film can sufficiently prolong the working lifetime of the drawing dies and improve their application effects. This research develops a novel composite diamond films owning great comprehensive properties, which have great potentials as protecting coatings on working surfaces of the wear-resistant and anti-frictional components.
WANG XinchangWANG LiangSHEN BinSUN Fanghong
关键词:摩擦磨损性能硼掺杂金刚石薄膜HFCVD
超光滑金刚石涂层拉拔模具在水润滑条件下的应用(英文)被引量:3
2013年
提出微/纳米多层超光滑金刚石复合薄膜的沉积工艺,采用经过改进的热丝CVD沉积装置,能够在孔径d1.0mm~60mm的硬质合金拉拔模具内孔表面沉积具有优异耐磨减摩特性的超光滑金刚石复合涂层。采用表面轮廓仪对超光滑金刚石复合涂层拉拔模具的内孔表面进行检测,结果显示拉拔模具入口区、工作区以及定径带位置的表面粗糙度分别为25.7,23.3和25.5nm。对超光滑金刚石复合涂层的摩擦磨损特性进行考察,结果表明,无论在干摩擦还是水润滑条件下,涂层与轴承钢、铜以及氮化硅陶瓷对摩时的摩擦因数均比常规微米金刚石涂层的低,并且还具有与微米金刚石涂层相当的表面耐磨性。采用制备的超光滑金刚石复合涂层拉拔模具在低碳钢管的拉拔加工过程中实现了基于水润滑的拉拔加工过程,与传统的硬质合金拉拔模具相比,单只超光滑金刚石复合涂层拉拔模具的拉拔产量可提高20倍左右。
沈彬孙方宏张志明沈荷生郭松寿
关键词:摩擦磨损性能干摩擦
沉积参数对WC-Co基体内孔HFCVD金刚石薄膜生长的影响(英文)被引量:2
2015年
在内孔HFCVD金刚石薄膜沉积过程中,沉积温度(t)、碳源浓度(φ)、总反应压力(ρ)和气体总流量(F)等沉积参数对金刚石薄膜的生长具有显著影响。采用Taguchi方法系统研究这4个关键参数对内孔HFCVD金刚石薄膜性能的综合影响,并且通过自定义的品质因数(figure-of-merit,FOM)评价金刚石薄膜的综合性能。沉积温度、碳源浓度和总反应压力对于内孔HFCVD金刚石薄膜的各项性能及FOM均存在显著影响,并且与平片或外表面沉积存在一定的差异。根据上述影响性分析的结果,以获得最佳的内孔HFCVD金刚石薄膜综合性能为优化目标所确定的最优化沉积参数为:t=830℃,φ=4.5%,ρ=4000 Pa,F=800 mL/min。
王新昶林子超沈彬孙方宏
关键词:内孔表面
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