Optical proximity correction (OPC) systems require an accurate and fast way to predict how patterns will be transferred to the wafer.Based on Gabor's 'reduction to principal waves',a partially coherent imaging system can be represented as a superposition of coherent imaging systems,so an accurate and fast sparse aerial image intensity calculation algorithm for lithography simulation is presented based on convolution kernels,which also include simulating the lateral diffusion and some mask processing effects via Gaussian filter.The simplicity of this model leads to substantial computational and analytical benefits.Efficiency of this method is also shown through simulation results.
We describe a post resolution-enhancement-technique verification method for use in manufacturing data flow. The goal of the method is to verify whether designs function as intended,or more precisely, whether the printed images are consistent with the design intent. The process modeling is described for the model-based verifi cation method. The performance of the method is demonstrated by experiment.
