For performance optimization such as placement,interconnect synthesis,and routing, an efficient and accurate interconnect delay metric is critical,even in design tools development like design for yield （DFY） and design for manufacture （DFM）. In the nanometer regime, the recently proposed delay models for RLC interconnects based on statistical probability density function （PDF）interpretation such as PRIMO,H-gamma,WED and RLD bridge the gap between accuracy and efficiency. However, these models always require table look-up when operating. In this paper, a novel delay model based on the Birnbaum-Saunders distribution （BSD） is presented. BSD can accomplish interconnect delay estimation fast and accurately without table look-up operations. Furthermore, it only needs the first two moments to match. Experimental results in 90nm technology show that BSD is robust, easy to implement,efficient,and accurate.
